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China Thermal spraying Manufacturer, Supplier, Factory

We rely upon strategic thinking, constant modernisation in all segments, technological advances and of course upon our employees that directly participate in our success for Thermal spraying, Thermal spraying technology, MLCC capacitor, Monocrystalline pulling Crucible, Three-petal Graphite Crucible, Our aim is "blazing new ground, Passing Value", in the future, we sincerely invite you to grow up with us and make a bright future together!
Thermal spraying, Being guided by customer demands, aiming at improving the efficiency and quality of customer service, we constantly improve products and provide more comprehensive services. We sincerely welcome friends to negotiate business and start cooperation with us. We hope to join hands with friends in different industries to create a brilliant future.

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    TaC Coated Graphite Wafer Carrier

    VeTek Semiconductor has carefully designed TaC Coated Graphite Wafer Carrier for customers. It is composed of high-purity graphite and TaC coating, which is suitable for various wafer epitaxial wafer processing. We have been specialized in SiC and TaC coating for many years. Compared with SiC coating, Our TaC coated graphite wafer carrier has a higher temperature resistance and wear-resistant. We look forward to becoming your long-term partner in China.
  • SiC Coating Set Disc

    SiC Coating Set Disc

    VeTek Semiconductor is top manufacturer of CVD SiC coatings in China, offers SiC Coating Set Disc in Aixtron MOCVD Reactors. These SiC Coating Set Disc are crafted using high purity graphite and feature a CVD SiC coating with impurity below 5ppm. Your inquiry is welcomed.
  • Electric Fused Quartz

    Electric Fused Quartz

    Electric fused quartz is made of high-purity SiCl4 and melted by hydrogen-oxygen flame. The product is bubble-free. VeTek Semiconductor has mature electric fused quartz production capabilities and strong production capacity, and can provide corresponding electric fused quartz products according to customer needs. VeTek Semiconductor looks forward to your inquiry.
  • SiC Coated Planetary Susceptor

    SiC Coated Planetary Susceptor

    Our SiC Coated Planetary Susceptor is a core component in the high temperature process of semiconductor manufacturing. Its design combines graphite substrate with silicon carbide coating to achieve comprehensive optimization of thermal management performance, chemical stability and mechanical strength.
  • C/C Composite Crucible

    C/C Composite Crucible

    Designed for the harsh environment of silicon single crystal production, the C/C Composite Crucible is an indispensable component of the semiconductor silicon single crystal production process.
  • Wafer Handling Robotic Arm

    Wafer Handling Robotic Arm

    Vetek Semiconductor thermal spraying technology plays a vital role in the application of wafer handling robotic arms, especially in semiconductor manufacturing environments that require high precision and high cleanliness. This technology significantly improves the durability, reliability and work efficiency of the equipment by coating special materials on the surface of the wafer handling robotic arm. Welcome to inquiry us.

  • What is the difference between CVD TaC and sintered TaC?

    This article first introduces the molecular structure and physical properties of TaC, and focuses on the differences and applications of sintered tantalum carbide and CVD tantalum carbide, as well as VeTek Semiconductor's popular TaC coating products.

  • How thin can the Taiko process make silicon wafers?

    The Taiko process thins silicon wafers using its principles, technical advantages and process origins.

  • What is an EPI Epitaxial Furnace? - VeTek Semiconductor

    The working principle of the epitaxial furnace is to deposit semiconductor materials on a substrate under high temperature and high pressure. Silicon epitaxial growth is to grow a layer of crystal with the same crystal orientation as the substrate and different thickness on a silicon single crystal substrate with a certain crystal orientation. This article mainly introduces the silicon epitaxial growth methods: vapor phase epitaxy and liquid phase epitaxy.

  • How to prepare CVD TaC coating? - Veteksemicon

    This article introduces the product characteristics of CVD TaC coating, the process of preparing CVD TaC coating using the CVD method, and the basic method for surface morphology detection of the prepared CVD TaC coating.

  • How much do you know about sapphire?

    This article describes that LED substrate is the largest application of sapphire, as well as the main methods of preparing sapphire crystals: growing sapphire crystals by the Czochralski method, growing sapphire crystals by the Kyropoulos method, growing sapphire crystals by the guided mold method, and growing sapphire crystals by the heat exchange method.

  • What is the difference between silicon carbide (SiC) and gallium nitride (GaN) applications? - VeTek Semiconductor

    SiC and GaN are wide bandgap semiconductors with advantages over silicon, such as higher breakdown voltages, faster switching speeds, and superior efficiency. SiC is better for high-voltage, high-power applications due to its higher thermal conductivity, while GaN excels in high-frequency applications thanks to its superior electron mobility.

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