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ALD Atomic Layer Deposition Recipe27 2024-07

ALD Atomic Layer Deposition Recipe

Spatial ALD, spatially isolated atomic layer deposition. The wafer moves between different positions and is exposed to different precursors at each position. The figure below is a comparison between traditional ALD and spatially isolated ALD.
Tantalum carbide technology breakthrough, SiC epitaxial pollution reduced by 75%?27 2024-07

Tantalum carbide technology breakthrough, SiC epitaxial pollution reduced by 75%?

Recently, the German research institute Fraunhofer IISB has made a breakthrough in the research and development of tantalum carbide coating technology, and developed a spray coating solution that is more flexible and environmentally friendly than the CVD deposition solution, and has been commercialized.
Exploratory application of 3D printing technology in the semiconductor industry19 2024-07

Exploratory application of 3D printing technology in the semiconductor industry

In an era of rapid technological development, 3D printing, as an important representative of advanced manufacturing technology, is gradually changing the face of traditional manufacturing. With the continuous maturity of technology and the reduction of costs, 3D printing technology has shown broad application prospects in many fields such as aerospace, automobile manufacturing, medical equipment, and architectural design, and has promoted the innovation and development of these industries.
Silicon(Si) epitaxy preparation technology16 2024-07

Silicon(Si) epitaxy preparation technology

Single crystal materials alone cannot meet the needs of the growing production of various semiconductor devices. At the end of 1959, a thin layer of single crystal material growth technology - epitaxial growth was developed.
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