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GaN-based low-temperature epitaxy technology27 2024-08

GaN-based low-temperature epitaxy technology

This article mainly describes GaN-based low-temperature epitaxial technology, including the crystal structure of GaN-based materials, 3. epitaxial technology requirements and implementation solutions, the advantages of low-temperature epitaxial technology based on PVD principles, and the development prospects of low-temperature epitaxial technology.
What is the difference between CVD TaC and sintered TaC?26 2024-08

What is the difference between CVD TaC and sintered TaC?

This article first introduces the molecular structure and physical properties of TaC, and focuses on the differences and applications of sintered tantalum carbide and CVD tantalum carbide, as well as VeTek Semiconductor's popular TaC coating products.
How to prepare CVD TaC coating? - Veteksemicon23 2024-08

How to prepare CVD TaC coating? - Veteksemicon

This article introduces the product characteristics of CVD TaC coating, the process of preparing CVD TaC coating using the CVD method, and the basic method for surface morphology detection of the prepared CVD TaC coating.
What is Tantalum Carbide TaC Coating? - Veteksemicon22 2024-08

What is Tantalum Carbide TaC Coating? - Veteksemicon

This article introduces the product characteristics of TaC coating, the specific process of preparing TaC coating products using CVD technology, introduces Veteksemicon's most popular TaC coating, and briefly analyzes the reasons for choosing Veteksemicon.
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